Last Updated： Aggregation Period:Jul 09, 2025～Aug 05, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Jul 09, 2025～Aug 05, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Jul 09, 2025～Aug 05, 2025
This ranking is based on the number of page views on our site.
1～7 item / All 7 items
Removal of ultrafine particles below 45nm required for semiconductors and liquid crystals.
Concentrated control of output due to built-in CPU High-frequency ultrasonic cleaner capable of feedback on operating status
The new standard for mega sonic cleaning! The masterpiece of Japan's Alex Corporation and the American BLACKSTONE-NEY Company, which continue to focus on ultrasonic transducers!
Through the technological fusion of Japan's Alex Corporation and the U.S. BLACKSTONE-NEY Corporation, a multi-frequency high-frequency ultrasonic cleaner has been realized, capable of switching 430 kHz at will with one ultrasonic oscillator and one ultrasonic transducer.
Precision cleaning of solar cells, FPD substrates, and HD substrates.
- A new generation cleaning machine compatible with 430 kHz and 950 kHz. - Inherits the high functionality of QUAVA, optimal for single-sheet cleaning. - Cleaning solution with ultrasound is sprayed from a tube-shaped nozzle. - Uniform cleaning is possible with a highly flexible tube-shaped nozzle. - Compatible with side and back irradiation. ● The tube can be selected from three types: front irradiation method, shower irradiation method, and side irradiation method. ● Due to the tube-type nozzle, it is easy to install equipment without limiting the space for the transducer.
High-frequency ultrasonic cleaning machine
This is a plunge-type ultrasonic cleaning machine with frequencies of 500 kHz and 1 MHz. It can utilize existing cleaning tanks. It adopts a digital ultrasonic oscillator, allowing the output to be adjusted in the range of 10% to 100%. Since it uses high-frequency ultrasound, it does not damage the items being cleaned. Output: 250 W, 500 W.
High-frequency cleaning machines suitable for precision cleaning (500kHz, 1MHz) ---- <<Test machine rental (for a fee), please contact us>>
The high-frequency ultrasonic cleaning machine UMC series utilizes high frequencies (500kHz, 1MHz) suitable for precision cleaning. The UMC series offers two models for each frequency type: 500kHz and 1MHz. The features of the UMC series are: 1. A digital ultrasonic oscillator that allows for easy setting of irradiation time, output mode, and adjustment of ultrasonic output. 2. An automatic resonance frequency search function that ensures stable ultrasonic output and high cleaning power. 3. An external control connector for remote control via a computer or other devices. 4. The ability to manufacture immersion-type and diaphragm-type transducers. This high-frequency ultrasonic cleaning machine UMC series is suitable for cleaning semiconductor wafers, hard disk substrates, display glass, sapphire substrates, quartz wafers, quartz glass, metal masks, and more.
Easy cleaning of small amounts of items and in laboratories! Overflow type with circulating cleaning solution.
The "W-357HPM" is a high-frequency ultrasonic cleaning machine of the one-unit type. With 1MHz cleaning, it is capable of removing submicron particles that adhere to precision parts. It has made cleaning small amounts of items and in laboratory settings easier. It is an overflow type that allows for the circulation of cleaning fluid. 【Features】 ■ One-unit type ■ Made cleaning small amounts of items and in laboratory settings easier ■ Capable of removing submicron particles that adhere to precision parts with 1MHz cleaning ■ Overflow type that allows for the circulation of cleaning fluid *For more details, please refer to the PDF document or feel free to contact us.
